Fused silica—fillers with extremely low thermal expansion

Fused silica is made synthetically in an electric arcing process at about 2000°C as an amorphous modification of quartz. It has a series of properties that are not united as completely at the same time in any other material. The most outstanding of these is its extremely low thermal coefficient of expansion (0,5*10^-6/K), excellent elasticity and thermal shock resistance. The properties are complemented by a high transformation temperature, high softening temperature, low thermal conductivity, good optical transmissivity, corrosion resistance and a diffusion blocking effect against most substances. Through non-ferrous milling and downline screening processes we are also in a position of being able to produce fused silica granulations in the 1 µm range.